Author: Endo, M.
Paper Title Page
WEPGW030 Beam Profile Monitor for Slow Extracted Beam Using Multi-Layered Graphene at J-PARC 2532
  • Y. Hashimoto, Y. Hori, R. Muto, M. Tomizawa, T. Toyama, M. Uota
    KEK, Tokai, Ibaraki, Japan
  • M. Endo, H. Sakai
    Mitsubishi Electric System & Service Co., Ltd, Tsukuba, Japan
  • M. Murakami, K. Murashima, M. Tachibana, A. Tatami
    KANEKA, Osaka, Japan
  Extracted-beam profiles in slow extraction at J-PARC has been measured by using secondary electrons emitted from a target array made by multi-layered graphen, in real time during spill time of around 2 seconds. The target array consists of 20 ribbons with width of 1 mm, pitch of 2 mm, and thickness of 1.1 micron. Secondary-electron current at each channel is measured by a current amplifier having sensitivity more than 1 pA. These configuration produces useful information for beam dynamics in slow extraction. We have set this monitor at the entrance of a septum magnet, then we can also measure the last few-turns beam with the extracted beam simultaneously. We will discuss about features of this instrument and recent beam study with 51 kW extracted-beams.  
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About • paper received ※ 15 May 2019       paper accepted ※ 21 May 2019       issue date ※ 21 June 2019  
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