Author: Nakamura, T.
Paper Title Page
THPTS026 Effect of Nitric Hydrofluoric Acid Treatment on Brazing of Alumina Ceramics and Pure Titanium 4161
  • M. Kinsho, J. Kamiya
    JAEA/J-PARC, Tokai-mura, Japan
  • K. Abe
    Hitachi Power Semiconductor Device, Ltd., Hitachishi, Ibaraki, Japan
  • T. Nakamura
    Asahi Kinzoku Co., Ltd., Gifu, Japan
  Alumina ceramics vacuum chamber which is used for the 3GeV rapid-cycling synchrotron (RCS) in J-PARC is composed of alumina duct, titanium (Ti) flanges and Ti sleeves. Before brazing the alumina duct and the Ti sleeves, the Ti sleeves were treated with nitric hydrofluoric acid. The purpose of this study is to clear the effect of this treatment for titanium material. It was cleared by SEM observation that the roughness of the titanium material after the nitric hydrofluoric acid treatment becomes big. It was also measured that the thickness of oxide film on surface of the titanium material was 12.7 nm before treatment and 6.0 nm after treatment. As a result of measuring the wettability of the brazing material which was silver brazing filler metal (Ag: 72%, Cu: 28%) on the Ti surface and the diffusion of the Ti material into the brazing material, it became clear that both the clearing of oxide layer on the alumina ceramics and the vacuum condition of the vacuum heating furnace were important for brazing between alumina ceramics and pure titanium.  
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About • paper received ※ 14 May 2019       paper accepted ※ 23 May 2019       issue date ※ 21 June 2019  
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